| Wavelength Range | : | 190-1100 nm |
| Spektrale bânbreedte | : | 2nm (5nm, 4nm, 1nm, 0,5nm opsjoneel) |
| Wavelength Accuracy | : | ± 0,3 nm |
| Wavelength Reproducibility | : | ≤0.15 nm |
| Fotometrysk systeem | : | Dûbele beam, automatyske scan, dûbele detektors |
| Fotometryske krektens | : | ±0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
| Photometric reproducibility | : | ≤0,15%τ |
| Wurkmodus | : | T, A, C, E |
| Fotometrysk berik | : | -0,3-3,5A |
| Stray Light | : | ≤0.05%τ (Nal, 220nm, NaNO2 360 nm) |
| Baseline Flatness | : | ± 0,002A |
| Stabiliteit | : | ≤0.001A/h (by 500nm, nei opwaarming) |
| Lûd | : | ± 0.001A (by 500nm, nei opwaarming) |
| Skerm | : | 6 inch hege ljocht blauwe LCD |
| Detector | : | Silicon foto-diode |
| Krêft | : | AC 220V/50Hz, 110V/60Hz 180W |
| Ofmjittings | : | 630 × 470 × 210 mm |
| Gewicht | : | 26kg |
| Wavelength Range | : | 190-1100 nm |
| Spektrale bânbreedte | : | 2nm (5nm, 4nm, 1nm, 0,5nm opsjoneel) |
| Wavelength Accuracy | : | ± 0,3 nm |
| Wavelength Reproducibility | : | 0.15nm |
| Fotometrysk systeem | : | Split-beam ratio monitoring, auto scan, dûbele detektors |
| Fotometryske krektens | : | ±0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
| Photometric reproducibility | : | 0,2%τ |
| Wurkmodus | : | T, A, C, E |
| Fotometrysk berik | : | -0.3-3A |
| Stray Light | : | ≤0.05%τ (Nal, 220nm, NaNO2 360 nm) |
| Baseline Flatness | : | ± 0,002A |
| Stabiliteit | : | ≤0.001A/30min (by 500nm, nei opwaarming) |
| Lûd | : | ± 0.001A (by 500nm, nei opwaarming) |
| Skerm | : | 6 inch hege ljocht blauwe LCD |
| Detector | : | Silicon foto-diode |
| Krêft | : | AC 220V/50Hz, 110V/60Hz 180W |
| Ofmjittings | : | 630 × 470 × 210 mm |
| Gewicht | : | 26kg |
| Wavelength Range | : | 190-1100 nm |
| Spektrale bânbreedte | : | 2nm (5nm, 1nm, opsjoneel) |
| Wavelength Accuracy | : | ± 0,3 nm |
| Wavelength Reproducibility | : | 0,2nm |
| Fotometrysk systeem | : | Single beam, plane grating fan 1200L/mm |
| Fotometryske krektens | : | ±0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
| Photometric reproducibility | : | ≤0,15%τ |
| Wurkmodus | : | T, A(-0,3-3A), C, E |
| Fotometrysk berik | : | -0.3-3A |
| Stray Light | : | ≤0.05%τ (Nal, 220nm, NaNO2 360 nm) |
| Baseline Flatness | : | ± 0,002A |
| Stabiliteit | : | ≤0.001A/30min (by 500nm, nei opwaarming) |
| Lûd | : | ± 0.001A (by 500nm, nei opwaarming) |
| Skerm | : | 6 inch hege ljocht blauwe LCD |
| Detector | : | Silicon foto-diode |
| Krêft | : | AC 220V/50Hz, 110V/60Hz 140W |
| Ofmjittings | : | 530 × 410 × 210 mm |
| Gewicht | : | 18kg |
| Wavelength Range | : | 320-1100 nm |
| Spektrale bânbreedte | : | 2nm (5nm, 1nm, opsjoneel) |
| Wavelength Accuracy | : | ± 0,5 nm |
| Wavelength Reproducibility | : | 0,2nm |
| Fotometrysk systeem | : | Single beam, plane grating fan 1200L/mm |
| Fotometryske krektens | : | ±0.3τ (0~100τ) ± 0.002A (0~0.5A) ±0.004A (0.5~1A) |
| Photometric reproducibility | : | ≤0,15%τ |
| Wurkmodus | : | T, A, C, E |
| Fotometrysk berik | : | -0.3-3A |
| Stray Light | : | ≤0.05%τ (Nal, 220nm, NaNO2 360 nm) |
| Baseline Flatness | : | ± 0,002A |
| Stabiliteit | : | ≤0.001A/30min (by 500nm, nei opwaarming) |
| Ljocht bron | : | Tungsten halogeen lamp |
| Skerm | : | 6 inch hege ljocht blauwe LCD |
| Detector | : | Silicon foto-diode |
| Krêft | : | AC 220V/50Hz, 110V/60Hz 140W |
| Ofmjittings | : | 530 × 410 × 210 mm |
| Gewicht | : | 18kg |